PRODUCT

  • PRODUCT
  • R&D Equipment

R&D Equipment

BACO’s R&D tool is designed for experiments and optimization of various materials and process conditions
and widely used for material development, thin film characterization, and process parameter.
This system provides high reproducibility and operational efficiency through fast setup and precise process control.

  • EUV Blank Mask Ion Beam Deposition System

    • Process Material : Mo, Si, Cr, CrO, C, SiN
    • Substrate : 12” Wafer, 200 × 200 mm² Glass
    • Uniformity : ≤3%

  • Cluster R&D Equipment

    • Process Material : Mo, Si, Cr, CrO, C, SiN
    • Substrate : 12” Wafer, 200 × 200 mm² Glass
    • Uniformity : ≤3%

  • TiCN/DLC High Hardness Sputtering System

    • Process : MCA Chuck Coating
    • Chuck Size : 8” – 12”
    • Uniformity : ≤3%

  • Multi-Reactive Sputtering System

    • Process Material : Metal, TCO, Oxide
    • Substrate : 4” – 8” Wafer
    • Uniformity : ≤3%
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